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Applied Physics B: Lasers and Optics

Volumn 72, Issue 3, 2001, Pages 385-387

Low-energy ion emission from a xenon gas-puff laser-plasma X-ray source

(6) Daido, H a Yamagami, S a Suzuki, M a Azuma, H b Choi, I W c Fiedorowicz, H d

a OSAKA UNIVERSITY (Japan)

b Rd Management Section (Japan)

c Korea Advanced Institute of Science and Technology (KAIST) (South Korea)

d MILITARY UNIVERSITY OF TECHNOLOGY (Poland)

Author keywords

[No Author keywords available]

Indexed keywords

ENERGY CONVERSION; ION BOMBARDMENT; ION SOURCES; LITHOGRAPHY; MIRRORS; SECONDARY ION MASS SPECTROMETRY; ULTRAVIOLET RADIATION; X RAY ANALYSIS; XENON;

ION EMISSION; X-RAY SOURCES;

LASER PRODUCED PLASMAS;

EID: 0034806383 PISSN: 09462171 EISSN: None Source Type: Journal
DOI: 10.1007/s003400100536 Document Type: Article

Times cited : (5)

References (12)

1
- 84975581218
- (1991) Opt. Lett. , vol.16 , pp. 1557
- Tichenor, A.¹ Kubiak, G.D.² Malinowski, M.E.³ Stulen, R.H.⁴ Haney, S.J.⁵ Berger, K.W.⁶ Brown, L.A.⁷ Freeman, R.R.⁸ Mansfield, W.M.⁹ Wood II, O.R.¹⁰ Tennant, D.M.¹¹ Bjorkholm, J.E.¹² MacDowell, A.A.¹³ Bokor, J.¹⁴ Jewell, T.E.¹⁵ White, D.L.¹⁶ Windt, D.L.¹⁷ Waskiewicz, W.K.¹⁸

2
- 0003437440
- Springer, Berlin
- (1992) X-Ray Microscopy III
- Michette, A.G.¹ Morison, G.R.² Buckley, C.J.³

3
- 21544439098
- (1993) Appl. Phys. Lett. , vol.62 , pp. 2778
- Fiedorowicz, H.¹ Bartnik, A.² Patron, Z.³ Parys, P.⁴

4
- 0032655074
- (1999) Opt. Commun. , vol.163 , pp. 103
- Fiedorowicz, H.¹ Bartnik, A.² Szczurek, M.³ Daido, H.⁴ Sakaya, N.⁵ Kimetik, V.⁶ Kato, Y.⁷ Suzuki, M.⁸ Matsumura, M.⁹ Tajima, J.¹⁰ Nakayama, T.¹¹ Wilhein, T.¹²

5
- 0034298740
- (2000) Opt. Commun. , vol.184 , pp. 161
- Fiedorowicz, H.¹ Bartnik, A.² Daido, H.³ Choi, I.W.⁴ Suzuki, M.⁵ Yamagami, S.⁶

6
- 0030675097
- Measurement and simulation of debris production from a laser-plasma X-ray source
- Chiba, Japan, 14-18 July, paper WI2
- (1997) Technical Digest Pacific Rim Conf. Lasers and Electro-Optics (CLEO/Pacific Rim '97) , pp. 84
- Daido, H.¹ Sharma, L.B.² Kato, Y.³ Yabe, T.⁴ Ohmura, E.⁵ Fukumoto, I.⁶ Tanaka, H.⁷ Nishi, N.⁸ Miyamoto, I.⁹

7
- 0001786766
- Debris-free EUVL sources based on gas jet
- ed. by G.D. Kubiak, D. Kania
- (1996) Proc. OSA TOPS Extreme Ultraviolet Lithography , vol.4 , pp. 66-71
- Kubiak, G.D.¹ Bernardez, L.J.² Krenz, K.D.³ O'Connell, D.J.⁴ Gutowski, R.⁵ Todd, A.M.M.⁶

8
- 33646415749
- (1994) J. Appl. Phys. , vol.75 , pp. 1923
- Zeng, G.M.¹ Daido, H.² Nishikawa, T.³ Takabe, H.⁴ Nakayama, S.⁵ Aritome, H.⁶ Murai, K.⁷ Kato, Y.⁸ Nakatsuka, M.⁹ Nakai, S.¹⁰

9
- 0017519874
- (1977) Rev. Sci. Instrum. , vol.48 , pp. 1064
- Pearlman, J.S.¹

10
- 0003314384
- (1999) Mater. Sci. Semicond. Process. , vol.2 , pp. 209
- Puga-Lambers, M.¹ Lambers, E.S.² Holloway, P.H.³

11
- 0037963353
- (1963) Phys. Rev. Lett. , vol.11 , pp. 401
- Meyerand R.G., Jr.¹ Haught, A.F.²

12
- 0034413652
- (2000) J. Opt. Soc. Am. B , vol.17 , pp. 1616
- Choi, I.W.¹ Daido, H.² Yamagami, S.³ Nagai, K.⁴ Norimatsu, T.⁵ Takabe, H.⁶ Suzuki, M.⁷ Nakayama, T.⁸ Matsui, T.⁹

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.