Bremsstrahlung emission and absorption in electron projection lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4343, Issue 1, 2001, Pages 95-106

  Hector, Scott ^a   Cobb, Jonathan ^a   Ivin, Vladimir ^b   Silakov, Mikhail V ^b   Babushkin, George A ^b  

^a MOTOROLA INC   (United States)

^b SOFT TEC   (Russian Federation)

Author keywords

Bremsstrahlung; Electron projection lithography; Monte Carlo modeling; Radiation damage

Indexed keywords

ASPECT RATIO; CMOS INTEGRATED CIRCUITS; COMPUTER SIMULATION; DIELECTRIC MATERIALS; ELECTRON SCATTERING; GATES (TRANSISTOR); LIGHT ABSORPTION; MONTE CARLO METHODS; PHOTONS; SUBSTRATES;

BREMSSTRAHLUNG EMISSION; ELECTRON PROJECTION LITHOGRAPHY;

ELECTRON BEAM LITHOGRAPHY;

EID: 0034768297     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.436640     Document Type: Article

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