Status of ArF lithography for the 130 nm technology node

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4000, Issue , 2000, Pages

  Ronse, K ^a   Vandenberghe, G ^a   Jaenen, P ^a   Delvaux, C ^a   Vangoidsenhoven, D ^a   Van Roey, F ^a   Pollers, I ^a   Maenhoudt, M ^a   Goethals, A M ^a   Pollentier, I ^a   Vleeming, B ^a   van Ingen Schenau, K ^a   Heskamp, B ^a   Davies, G ^a   Finders, J ^a  

^a IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

MASKS; OPTICAL INSTRUMENT LENSES; PHASE SHIFT;

PHASE SHIFTING MASKS (PSM);

PHOTOLITHOGRAPHY;

EID: 0033684526     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)