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Volumn 4000, Issue , 2000, Pages
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KrF lithography for 130 nm
a
a
ASML
(Netherlands)
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Author keywords
[No Author keywords available]
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Indexed keywords
DIFFRACTIVE OPTICS;
EXCIMER LASERS;
MASKS;
KRYPTON FLUORIDE LITHOGRAPHY;
PHOTOLITHOGRAPHY;
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EID: 0033681594
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (14)
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References (9)
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