Re-evaluating simple lambda based design rules for low K1 lithography process control

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3998, Issue , 2000, Pages 901-912

  Postnikov, Sergei ^a   Lucas, Kevin ^a   Roman, Bernard ^a   Wimmer, Karl ^a  

^a MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

PRINTED CIRCUIT DESIGN; PRINTED CIRCUIT MANUFACTURE; PROCESS CONTROL; SEMICONDUCTOR DEVICE MANUFACTURE;

LAMBDA-BASED RULES; OPTICAL PROXIMITY CORRECTION (OPC); RAYLEIGH LITHOGRAPHIC FACTOR;

LITHOGRAPHY;

EID: 0033714530     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)