Dimensional metrology system of shape and scale in pattern transfer

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3998, Issue , 2000, Pages 206-217

  McIntosh, John M ^a   Kane, Brittin ^a   Houge, Eric ^a   Vartuli, Cathy ^a   Mei, Xin ^a  

^a NOKIA RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CORRELATION METHODS; EDGE DETECTION; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS; WAVEFORM ANALYSIS;

CRITICAL DIMENSIONS (CD); MULTIPLE PARAMETER CHARACTERIZATION (MPC);

LITHOGRAPHY;

EID: 0033701162     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)