Towards a unified advanced CD-SEM specification for sub-0.18 μm Technology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3332, Issue , 1998, Pages 138-150

  Allgair, John ^a   Archie, Chas ^a   Banke, Bill ^a   Bogardus, Hal ^a   Griffith, Joe ^a   Marchman, Herschel ^a   Postek, Michael T ^a   Saraf, Lumdas ^a   Schlesinger, Jerry ^a   Singh, Bhanwar ^a   Sullivan, Neal ^a   Trimble, Lee ^a   Vladar, Andras ^a   Yanof, Arnold ^a  

^a MOTOROLA INC   (United States)

Author keywords

Accuracy; Charging; Contamination; Critical dimension; Matching; Metrology; Patt ern recognition; Precision; Scanning electron microscope; Specification

Indexed keywords

LITHOGRAPHY; MEASUREMENTS; PATTERN RECOGNITION; SILICON WAFERS;

CRITICAL DIMENSION CONTROL;

SCANNING ELECTRON MICROSCOPY;

EID: 18544366714     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.308724     Document Type: Conference Paper

References (7)

1. Guidelines for evaluating and expressing the uncertainty of NIST measurement results
2. Statistical verification of multiple CD SEM Matching
3. Measuring the performance of scanning electron microscope detectors