Simulations of SCALPEL wafer-heating correction using an adaptive Kalman Filter

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4343, Issue , 2001, Pages 138-154

  Stanton, S ^a  

^a AGERE SYSTEMS   (United States)

Author keywords

Correction; Kalman Filter; Lithography; SCALPEL; Wafer heating

Indexed keywords

ADAPTIVE FILTERING; ALGORITHMS; BOUNDARY CONDITIONS; COMPUTER SIMULATION; ELECTRIC DISTORTION; ELECTRON SCATTERING; ERROR CORRECTION; IMAGING TECHNIQUES; KALMAN FILTERING; SCANNING; THERMAL LOAD;

WAFER HEATING CORRECTION;

ELECTRON BEAM LITHOGRAPHY;

EID: 0034761502     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.436644     Document Type: Conference Paper

References (17)

1. Global Alignment Algorithm
2. Analytical-Based Solutions for SCALPEL Wafer-Heating