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Volumn 432, Issue 3, 1999, Pages 178-188

A synchrotron study of the deposition of vanadia on TiO2(110)

Author keywords

Auger electron spectroscopy; Clusters; Growth; Near edge extended X ray absorption fine structure (NEXAFS); Single crystal surfaces; Synchrotron radiation; Titanium oxide; Vanadium oxide

Indexed keywords

AGGLOMERATION; AUGER ELECTRON SPECTROSCOPY; DEPOSITION; FILM GROWTH; INTERFACES (MATERIALS); LOW ENERGY ELECTRON DIFFRACTION; PHOTOEMISSION; SYNCHROTRON RADIATION; TEMPERATURE; TITANIUM DIOXIDE; VANADIUM COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0344240161     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(99)00399-4     Document Type: Article
Times cited : (55)

References (44)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.