Improvement of thickness distribution and crystallinity of ZnO thin films prepared by radio frequency planer magnetron sputtering

Vacuum

Volumn 51, Issue 4, 1998, Pages 565-569

  Takeuchi, M ^a   Inoue, K ^a   Yoshino, Y ^a   Ohwada, K ^a  

^a MURATA MANUFACTURING CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL ORIENTATION; FILM PREPARATION; LATTICE CONSTANTS; MAGNETRON SPUTTERING; SILICON WAFERS; STRESS ANALYSIS; STRESS CONCENTRATION; THIN FILMS; X RAY CRYSTALLOGRAPHY;

RADIO FREQUENCY PLANER MAGNETRON SPUTTERING; THICKNESS DISTRIBUTION;

ZINC OXIDE;

EID: 0032309488     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0042-207x(98)00254-1     Document Type: Article

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