Furnace oxynitridation in nitric oxide of thin silicon oxide: Atomic transport mechanisms and interfacial microstructure

Materials Research Society Symposium - Proceedings

Volumn 592, Issue , 2000, Pages 269-274

  Trimaille, I ^a   Ganem, J J ^a   Gosset L G ^a   Bailly, O ^a   Rigo, S ^a   Cantin, J L ^a   Von Bardeleben, H J ^a  

^a UNIVERSITÉ PARIS DESCARTES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL ATOMIC STRUCTURE; CRYSTAL MICROSTRUCTURE; ELECTRON SPIN RESONANCE SPECTROSCOPY; NITROGEN OXIDES; OXIDATION; SILICA;

OXYNITRIDATION;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 0034498002     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)

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2. L. G. Gösset, J. J. Ganem, H. J. von Bardeleben, S. Rigo, I. Trimaille, J. L. Cantin, T. Akermark, and I. C. Vickridge, J. Appl. Phys. 85, 3661 (1999).
3. E. P. Gusev, H. C. Lu, E. Garfunkel, T. Gustafsson, M. L. Green, D. Brasen, and W. N. Lennard, J. Appl. Phys. 84,2980 (1998).
4. J. J. Ganem, S. Rigo, I. Trimaille, I. J. R. Baumvol and F. C. Stedile, Appl. Phys. Lett. 68, 2366 (1996).
5. M. Bersani, L. Vanzetti, M. Sbetti, M. Anderle, Appl. Surf. Sci. 144-145, 301 (1999).