Hole and electron trapping in ion implanted thermal oxides and SIMOX

IEEE Transactions on Nuclear Science

Volumn 47, Issue 6 III, 2000, Pages 2189-2195

  Mrstik, B J ^b   Hughes, H L ^a,b   McMarr, P J ^c   Lawrence, R K ^c   Ma, D I ^b   Isaacson, I P ^b   Walker, R A ^b  

^a IEEE   (United States)

^b NAVAL RESEARCH LABORATORY   (United States)

^c SFA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ION IMPLANTED THERMAL OXIDES; SEPARATION BY IMPLANTATION OF OXYGEN;

ALUMINUM; ELECTRON TRAPS; HOLE TRAPS; IONS; PHOSPHORUS; SILICA; SILICON;

ION IMPLANTATION;

EID: 0034452329     PISSN: 00189499     EISSN: None     Source Type: Journal    
DOI: 10.1109/23.903752     Document Type: Conference Paper

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