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Volumn 617, Issue , 2000, Pages

Ablation-induced stresses in fused silica by 157-nm F2-laser irradiation

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; INTERFEROMETERS; LASER ABLATION; MICROELECTROMECHANICAL DEVICES; MICROSTRUCTURE; OPTICAL MICROSCOPY; STRAIN RATE; SUBSTRATES; TENSILE STRESS; THIN FILMS;

EID: 0034439794     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-617-j3.3     Document Type: Conference Paper
Times cited : (10)

References (30)
  • 1
    • 0004832105 scopus 로고
    • Thin films: Stresses and mechanical properties I to VII
    • (1988) MRS Proc. , vol.130


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.