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Volumn 617, Issue , 2000, Pages
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Ablation-induced stresses in fused silica by 157-nm F2-laser irradiation
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Author keywords
[No Author keywords available]
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Indexed keywords
ETCHING;
INTERFEROMETERS;
LASER ABLATION;
MICROELECTROMECHANICAL DEVICES;
MICROSTRUCTURE;
OPTICAL MICROSCOPY;
STRAIN RATE;
SUBSTRATES;
TENSILE STRESS;
THIN FILMS;
OPTICAL INTERFEROMETRIC MICROSCOPES;
FUSED SILICA;
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EID: 0034439794
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1557/proc-617-j3.3 Document Type: Conference Paper |
Times cited : (10)
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References (30)
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