Reliability of tantalum based diffusion barriers between Cu and Si

Materials Research Society Symposium-Proceedings

Volumn 612, Issue , 2000, Pages D741-D746

  Laurila, Tomi ^a   Zeng, Kejun ^a   Kivilahti, Jorma K ^a   Seppala A ^b   Molarius, Jyrki ^c   Suni, Ilkka ^c  

^a Laboratory of Space Technology   (Finland)

^b UNIVERSITY OF HELSINKI   (Finland)

^c VTT TECHNICAL RESEARCH CENTRE OF FINLAND   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION IN SOLIDS; PHASE DIAGRAMS; SCANNING ELECTRON MICROSCOPY; SILICON COMPOUNDS; TANTALUM; TERNARY SYSTEMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

DIFFUSION BARRIERS;

METALLIZING;

EID: 0034431477     PISSN: 02729172     EISSN: None     Source Type: Journal    
DOI: 10.1557/proc-612-d7.4.1     Document Type: Article

References (16)