Patterning 220 nm pitch DRAM patterns by using double mask exposure

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4000 (I), Issue , 2000, Pages 283-292

  Nam, Dongseok ^a   Seong, Nakgeuon ^a   Cho, Hanku ^a   Moon, Jootae ^a   Lee, Sangin ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DYNAMIC RANDOM ACCESS STORAGE; MASKS;

DOUBLE MASK EXPOSURE (DOME);

PHOTOLITHOGRAPHY;

EID: 0033684901     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.389017     Document Type: Conference Paper

References (8)