Reduction of isolated-dense bias by optimization off-axis illumination for 150 nm lithography using KrF

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3679, Issue II, 1999, Pages 691-696

  Kim, Seok Kyun ^a   Ahn, Chang Nam ^a   Kim, Seo Min ^a   Ham, Young Mog ^a   Baik, Ki Ho ^a  

^a Hynix Semiconductor Inc   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ERROR CORRECTION; MASKS; OPTIMIZATION; PHASE SHIFT;

ISOLATED-DENSE BIAS; OFF-AXIS ILLUMINATION (OAI); OPTICAL PROXIMITY CORRECTION (OPC);

PHOTOLITHOGRAPHY;

EID: 0032665202     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.354384     Document Type: Conference Paper

References (3)