New fast atom beam processing with separated masks for fabricating multiple microstructures

Thin Solid Films

Volumn 281-282, Issue 1-2, 1996, Pages 630-633

  Ichiki, K ^a   Hatakeyama, M ^a   Tanaka, S ^b   Nakao, M ^b   Hatamura, Y ^b  

^a EBARA CORPORATION   (Japan)

^b UNIVERSITY OF TOKYO   (Japan)

Author keywords

Atomic and molecular beam studies; Etching; Silicon oxide; Surface morphology

Indexed keywords

DIFFRACTION GRATINGS; ELECTRODES; ELECTROFORMING; ETCHING; FABRICATION; MASKS; MICROSTRUCTURE; MOLECULAR BEAMS; MORPHOLOGY; OPTICS; SURFACES; THICK FILMS;

FAST ATOM BEAM PROCESSING; MICRO DIFFRACTION GRATING; MICRO OPTICS ARRAYS; MICRO POSITIONER; MULTIPLE MICROSTRUCTURES; PARALLEL PLATE ELECTRODES; SILICON OXIDE; SULFUR HEXAFLUORIDE;

ATOMIC BEAMS;

EID: 0030218511     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(96)08708-1     Document Type: Article

References (3)

1. F. Shimokawa, H. Tanaka, Y. Uenishi and R. Sawada, J. Appl. Phys., 66 (6) (1989) 2613-2618.
2. M. Hatakeyama, K. Ichiki, T. Kobata, M. Nakao and Y. Hatamura, IEICE Trans. Electron., E78-C (1995) 174-179.
3. M. Nakao, S. Tanaka, Y. Hatamura, M. Hatakeyama and K. Ichiki, The 72nd JSME Spring Annual Meeting, (VI) (1995) 265-268.