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Volumn 39, Issue 12 B, 2000, Pages 6815-6818

Contrast measurement of reflection masks fabricated from Cr and Ta absorbers for extreme ultraviolet lithography

Author keywords

Contrast; EUV; Lithography; Multilayer; Reflection mask

Indexed keywords

CHROMIUM; LIGHT ABSORPTION; LIGHT REFLECTION; MASKS; MULTILAYERS; OPTICAL FILMS; TANTALUM; ULTRAVIOLET RADIATION;

ULTRAVIOLET LITHOGRAPHY;

PHOTOLITHOGRAPHY;

EID: 0034428087 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.39.6815 Document Type: Article

Times cited : (5)

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