Alternative NH4F/HCl solution for ultraclean Si(001) surface

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 5, 2000, Pages 2542-2548

  Bok, T H ^a   Ye, J H ^b   Li, Sam F Y ^a,b  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

IMPURITIES; MASS SPECTROMETRY; REDOX REACTIONS; SCANNING TUNNELING MICROSCOPY; SILICON; SURFACE ROUGHNESS;

ULTRACLEAN SILICON SURFACES; X RAY FLUORESCENCE SPECTROMETRY;

CHEMICAL CLEANING;

EID: 0034350341     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1286201     Document Type: Article

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