Atomic scale flattening and hydrogen termination of the Si(001) surface by wet-chemical treatment

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 3, 1996, Pages 854-858

  Morita, Yukinori ^a   Tokumoto, Hiroshi ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

EID: 5844384353     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580403     Document Type: Article

References (15)

1. V. A. Burrows, Y. J. Chabal, G. S. Higashi, K. Raghavachari, and S. B. Christman, Appl. Phys. Lett. 53, 998 (1988).
2. T. Takahagi, I. Nagai, A. Ishitani, H. Kuroda, and Y. Nagasawa, J. Appl. Phys. 64, 3516 (1988).
3. G. S. Higashi, Y. J. Chabal, G. W. Trucks, and K. Raghavachari, Appl. Phys. Lett. 56, 656 (1990).
4. S. Watanabe, N. Nakayama, and T. Ito, Appl. Phys. Lett. 59, 1458 (1991).
5. Y. Morita, K. Miki, and H. Tokumoto, Jpn. J. Appl. Phys. 30, 3570 (1991).
6. H. Tokumoto, Y. Morita, and K. Miki, Mater. Res. Soc. Symp. Proc. 259, 409 (1992).
7. Y. J. Chabal, Mater. Res. Soc. Symp. Proc. 259, 349 (1992).
8. U. Neuwald, H. E. Hessel, A. Feltz, U. Memmert, and R. J. Behm, Surf. Sci. Lett. 296, 8 (1993).
9. Y. Morita, and H. Tokumoto, Mater. Res. Soc. Symp. Proc. 318, 293 (1994).
10. S.-L. Yau, K. Kaji, and K. Itaya, Appl. Phys. Lett. 66, 766 (1995).
11. Y. Morita, and H. Tokumoto, Appl. Phys. Lett. 67, 2654 (1995).
12. J. E. Northrup, Phys. Rev, B 44, 1419 (1991).
13. J. J. Boland, Surf. Sci. 261, 17 (1992).
14. J. M. Gibson, M. Y. Lanzerotti, and V. Elser, Appl. Phys. Lett. 55, 1394 (1989).
15. Y. Morita, and H. Tokumoto, Mater. Res. Soc. Symp. Proc. 315, 491 (1993).