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Volumn 37, Issue 6, 2000, Pages 1062-1066
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Optimization of the low-temperature MOCVD process for PZT thin films
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Author keywords
[No Author keywords available]
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Indexed keywords
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EID: 0034347708
PISSN: 03744884
EISSN: None
Source Type: Journal
DOI: 10.3938/jkps.37.1062 Document Type: Article |
Times cited : (6)
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References (11)
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