Fabrication and characterization of ferroelectric Pb(ZrxTi1-x)O3 thin films by metalorganic chemical vapor deposition

Journal of Materials Research

Volumn 14, Issue 2, 1999, Pages 487-493

  Song, Han Sang ^a   Kim, Tae Song ^b   Kim, Chang Eun ^a   Jung, Hyung Jin ^b  

^a Yonsei University   (South Korea)

^b Korea Institute of Science and Technology   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC PROPERTIES; FILM GROWTH; LEAD COMPOUNDS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PERMITTIVITY; PHASE TRANSITIONS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

COERCIVE FIELD; FERROELECTRIC THIN FILM; REMANENT POLARIZATION; SPONTANEOUS POLARIZATION;

DIELECTRIC FILMS;

EID: 0033075121     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.1999.0069     Document Type: Article

References (12)

1. K. Okamoto, Y. Nasu, M. Okuyama, and Y. Hamaka, Jpn. J. Appl. Phys. Suppl. 20-1, 215 (1981).
2. Y. Matsui, M. Okuyama, M. Noda, and Y. Hamakawa, Appl. Phys. Lett. A28, 161 (1982).
3. J. Crrano, C. Sudhama, J. Lee, A. Tasch, and W. Miller, Int. Electron Devices Meeting, IEDM Tech. Dig., Washington, DC (IEEE, New York, 1989), p. 255
4. J. F. Scott and C. A. Paz Araujo, Science 246, 1400 (1989).
5. T. S. Kim, D. J. Kim, J. K. Lee, and H. J. Jung, in Ferroelectric Thin Films V, edited by S. B. Desu, R. Ramesh, B. A. Tuttle, R. E. Jones, and I. K. Yoo (Mater. Res. Soc. Symp. Proc. 433, Pittsburgh, PA, 1996), p. 243.
6. R. Ramesh, A. Inam, W. K. Chan, F. Tillerot, B. Wikens, C. C. Chang, T. Sands, J. M. Tarascon, and V. G. Keramidas, Appl. Phys. Lett. 59 (27), 3542 (1991).
7. B. A. Tuttle, T. J. Headley, B. C. Bunker, R. W. Schwartz, T. J. Zender, C. L. Hernandez, D. C. Goodnow, R. J. Tissol, and J. Michael, J. Mater. Res. 7, 1876 (1992).
8. G. J. M. Dormans, P. K. Larsen, G. A. C. M. Spielings, J. Dikken, M. J. E. Ulenaers, R. Cuppens, D. J. Taylor, and R. D. J. Verhaar, Int. Ferroelectrics 6, 93 (1995).
9. K. Kashihira, H. Itoh, K. Tsukamato, and Y. Akasaka, in Extended Abstracts of the 1991 International Conference on Solid State Devices and Materials, Yokohama, Japan (Business Center for Acad. Soc. Japan, Tokyo, Japan, 1991), p. 192.
10. M. H. Francombe, Thin Solid Films 13, 413 (1972).
11. K. Okazaki and K. Nagata, J. Am. Ceram. Soc. 56, 82 (1973).
12. D. J. Eichorstand and C. J. Baron, in Ferroelectric Thin Films III, edited by E. R. Myer, B. A. Tuttle, S. B. Desu, and P. K. Larsen (Mater. Res. Soc. Symp. Proc. 310, Pittsburgh, PA, 1993), p. 201.