Mechanism of DNA damage photosensitized by trisbipyrazyl ruthenium complex. Unusual role of Cu/Zn superoxide dismutase

Photochemistry and Photobiology

Volumn 72, Issue 5, 2000, Pages 583-589

  Gicquel, Etienne ^a   Paillous, Nicole ^a   Vicendo, Patricia ^a  

^a UNIVERSITÉ DE TOULOUSE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; DOUBLE STRANDED DNA; OLIGONUCLEOTIDE; PHOTOSENSITIZING AGENT; POLYACRYLAMIDE; RUTHENIUM DERIVATIVE; SINGLE STRANDED DNA; SINGLET OXYGEN; SUPEROXIDE DISMUTASE; TRISBIPYRAZYL RUTHENIUM; UNCLASSIFIED DRUG; ZINC;

ARTICLE; DNA DAMAGE; ELECTRON TRANSPORT; GEL ELECTROPHORESIS; PHOTOLYSIS; PHOTOSENSITIZATION;

BASE SEQUENCE; DNA DAMAGE; OLIGODEOXYRIBONUCLEOTIDES; ORGANOMETALLIC COMPOUNDS; OXIDATION-REDUCTION; PHOTOLYSIS; PHOTOSENSITIZING AGENTS; SUPEROXIDE DISMUTASE;

EID: 0034335262     PISSN: 00318655     EISSN: None     Source Type: Journal    
DOI: 10.1562/0031-8655(2000)072<0583:MODDPB>2.0.CO;2     Document Type: Article

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