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Volumn 40, Issue 11, 2000, Pages 1823-1831

Effects of quantization on random telegraph signals observed in deep-submicron MOSFETs

Author keywords

[No Author keywords available]

Indexed keywords

BAND STRUCTURE; COMPUTATIONAL METHODS; INTERFACES (MATERIALS); MOSFET DEVICES; SEMICONDUCTING SILICON; SEMICONDUCTOR DOPING; SILICA; SUBSTRATES;

EID: 0034325333     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0026-2714(00)00083-4     Document Type: Article
Times cited : (20)

References (12)
  • 1
    • 0033884180 scopus 로고    scopus 로고
    • A method for locating the position of oxide traps responsible for random telegraph signals in sub-micron MOSFETs
    • Çelik-Butler Z, Vasina P, Amarasinghe NV. A method for locating the position of oxide traps responsible for random telegraph signals in sub-micron MOSFETs. IEEE Trans Electron Dev 2000;47(3):646.
    • (2000) IEEE Trans Electron Dev , vol.47 , Issue.3 , pp. 646
    • Çelik-Butler, Z.1    Vasina, P.2    Amarasinghe, N.V.3
  • 2
    • 34547827353 scopus 로고
    • Properties of semiconductor surface inversion layers in the electric quantum limit
    • Stern F, Howard WE. Properties of semiconductor surface inversion layers in the electric quantum limit. Phys Rev 1967;163:816.
    • (1967) Phys Rev , vol.163 , pp. 816
    • Stern, F.1    Howard, W.E.2
  • 4
    • 0024178560 scopus 로고
    • Flicker noise characteristics of advanced MOS technologies
    • Hung KK, Ko PK, Hu C, Cheng YC. Flicker noise characteristics of advanced MOS technologies. IEDM Tech Dig 1988. p. 34.
    • (1988) IEDM Tech Dig , pp. 34
    • Hung, K.K.1    Ko, P.K.2    Hu, C.3    Cheng, Y.C.4
  • 6
    • 0012278046 scopus 로고
    • Noise in solid-state microstructure
    • Kirton MJ, Uren MJ. Noise in solid-state microstructure. Adv Phys 1989;38:367.
    • (1989) Adv Phys , vol.38 , pp. 367
    • Kirton, M.J.1    Uren, M.J.2
  • 8
    • 0025398785 scopus 로고
    • A unified model for the Flicker noise in metal-oxide-semiconductor field-effect transistors
    • Hung KK, Ko PK, Cheng YC. A unified model for the Flicker noise in metal-oxide-semiconductor field-effect transistors. IEEE Trans Electron Dev 1990;37:654.
    • (1990) IEEE Trans Electron Dev , vol.37 , pp. 654
    • Hung, K.K.1    Ko, P.K.2    Cheng, Y.C.3
  • 9
    • 4243352485 scopus 로고
    • Surface mobility fluctuations in metal oxide-semiconductor field-effect transistor
    • Surya C, Hsiang TY. Surface mobility fluctuations in metal oxide-semiconductor field-effect transistor. Phys Rev B 1987;35:6343.
    • (1987) Phys Rev B , vol.35 , pp. 6343
    • Surya, C.1    Hsiang, T.Y.2
  • 10
    • 0001633790 scopus 로고
    • The scattering of electrons by surface oxide charge and by lattice vibrations at the silicon-silicon dioxide interface
    • Sah CT, Ning TH, Tschopp LL. The scattering of electrons by surface oxide charge and by lattice vibrations at the silicon-silicon dioxide interface. Surface Sci 1972;32:561.
    • (1972) Surface Sci , vol.32 , pp. 561
    • Sah, C.T.1    Ning, T.H.2    Tschopp, L.L.3
  • 11
    • 0032687555 scopus 로고    scopus 로고
    • Quantum effects on the extraction of MOS oxide trap by 1/f noise measurement
    • Pacelli A, Villa S, Lacaita AL, Perron LM. Quantum effects on the extraction of MOS oxide trap by 1/f noise measurement. IEEE Trans Electron Dev 1999;46:1029.
    • (1999) IEEE Trans Electron Dev , vol.46 , pp. 1029
    • Pacelli, A.1    Villa, S.2    Lacaita, A.L.3    Perron, L.M.4
  • 12
    • 0033185086 scopus 로고    scopus 로고
    • Channel length scaling of 1/f noise in 0.18 μm technology MDD n-MOSFETs
    • Çelik-Butler Z, Vasina P. Channel length scaling of 1/f noise in 0.18 μm technology MDD n-MOSFETs. Solid-State Electron 1999;43:1695.
    • (1999) Solid-State Electron , vol.43 , pp. 1695
    • Çelik-Butler, Z.1    Vasina, P.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.