Electron field emission from filtered arc deposited diamond-like carbon films using Au and Ti layers

Diamond and Related Materials

Volumn 8, Issue 1, 1999, Pages 52-55

  Mao, D S ^a   Zhao, J ^a   Li, W ^a   Wang, X ^a   Liu, X H ^a   Zhu, Y K ^b   Fan, Z ^b   Zhou, J Y ^b   Li, Q ^b   Xu, J F ^b  

^a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

^b EAST CHINA NORMAL UNIVERSITY   (China)

Author keywords

Diamond like carbon; Electron field emission; Emission current density; Ti layer

Indexed keywords

CARBON; CURRENT DENSITY; ELECTRIC ARCS; ELECTRON EMISSION; FLUORESCENCE; GOLD; INTERFACES (MATERIALS); PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTOR DIODES; SILICON WAFERS; TITANIUM; TITANIUM CARBIDE;

DIAMOND LIKE CARBON (DLC) FILMS; FILTERED ARC DEPOSITION (FAD);

AMORPHOUS FILMS;

EMISSION;

EID: 0033061051     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(98)00366-5     Document Type: Article

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