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Surface and Coatings Technology

Volumn 94-95, Issue , 1997, Pages 309-314

High compressive stresses in titanium nitride made by CVD and post-implanted with yttrium ions

(2) Perry, Anthony J a Geist, Daniel E b

a AIMS Marketing (United States)

b LOCKHEED MARTIN (United States)

Author keywords

Compressive stress; CVD; TiN; Yttrium ion implantation

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPRESSIVE STRENGTH; ION IMPLANTATION; RESIDUAL STRESSES; STRAIN; STRESS CONCENTRATION; YTTRIUM;

STRAIN DISTRIBUTION;

TITANIUM NITRIDE;

EID: 0031245619 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/S0257-8972(97)00252-1 Document Type: Article

Times cited : (2)

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