Nanolithography by electron beam resist-trimming technique

Superlattices and Microstructures

Volumn 28, Issue 5-6, 2000, Pages 469-475

  Maeda, Tatsuro ^a   Ishii, Kenichi ^a   Hiroshima, Hiroshi ^a  

^a ELECTROTECHNICAL LABORATORY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DRY ETCHING; NANOTECHNOLOGY; PHOTORESISTS; PLASMA APPLICATIONS; POLYSILICON; SILICON ON INSULATOR TECHNOLOGY;

NANOMETER SCALE DEVICE; OXYGEN PLASMA; RESIST TRIMMING PROCESS;

ELECTRON BEAM LITHOGRAPHY;

EID: 0034317525     PISSN: 07496036     EISSN: None     Source Type: Journal    
DOI: 10.1006/spmi.2000.0950     Document Type: Article

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