Control of plasma parameters for high-quality hydrogenated amorphous carbon growth

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 11, 2000, Pages 6427-6431

  Azuma, Kazufumi ^a   Inaba, Hiroshi ^a   Tasaka, Kenji ^a   Fujimaki, Shigehiko ^a   Shirai, Hajime ^b  

^a HITACHI LTD   (Japan)

^b SAITAMA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; DENSIFICATION; ELECTRIC POTENTIAL; FILM GROWTH; HYDROGENATION; METHANE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX;

COULOMB SCREENING POTENTIALS; ION ENERGIES;

AMORPHOUS FILMS;

EID: 0034315307     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.6427     Document Type: Article

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