Generation of arbitrary three dimensional surfaces by X-ray lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 6, 2000, Pages 2976-2980

  Feldman, M ^a   Lee, G S ^a   Noel, D ^a   Khan Malek, C ^b   Bass, R ^c  

^a LOUISIANA STATE UNIVERSITY   (United States)

^b CNRS   (France)

^c NAVAL RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABLATION; CRYSTAL MICROSTRUCTURE; ELECTRONS; MICROMACHINING; PHOTONS; POLYTETRAFLUOROETHYLENES;

PIXELS;

X RAY LITHOGRAPHY;

EID: 0034315128     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1321272     Document Type: Article

References (12)

1. W. Daeschner, P. Long, M. Larsson, and S. H. Lee, J. Vac. Sci. Technol. B 13, 2729 (1995).
2. K Reimer, R. Engelke, U. Hofmann, P. Merz, K. T. Kohlmann-von. Platen, and B. Wagner, Proc. SPIE 3879, 98 (1999).
3. M. Inayoshi, M. Ito, M. Hori, T. Goto, and M. Hiramatsu, J. Vac. Sci. Technol. B 17, 949 (1999).
4. Y. Zhang, T. Katoh, M. Washio, H. Yamada, and S. Hamada, Appl. Phys. Lett. 67, 872 (1995).
5. Y. Tanaka, T. Iwamoto, K. Fujii, Y. Kikuchi, Y. Matsui, M. Fukuda, and H. Morita, J. Vac. Sci. Technol. B 17, 3415 (1999).
6. Alpha-Step 200, KLA-Tencor, 160 Rio Robles, San Jose, CA 95134.
7. D. C. Mancini (private communication).
8. Duro Master Blend Epoxy, Loctite Corporation, 1001 Trout Brook Cross-ing, Rocky Hill, CT 06067.
9. J-B Weld Epoxy, J-B Weld Company, PO Box 483, Sulphur Springs, TX 75483.
10. M. Feldman, U.S. Patent No. 6,018,422 (January 25, 2000).
11. J. K. Simons, S. P. Frigo, J. W. Taylor, and R. A. Rosenberg, J. Vac. Sci. Technol. A 12, 681 (1994).
12. B. K. Smith, C. D. Brown, G. La Vigne, and J. J. Sniegowski, Proc. SPIE 3511, 114 (1998).