Atomic structure of SiO2 at SiO2/Si interfaces

Applied Surface Science

Volumn 166, Issue 1, 2000, Pages 455-459

  Hirose, K ^a   Nohira, H ^b   Sakano, K ^b   Hattori, T ^b  

^a JAPAN AEROSPACE EXPLORATION AGENCY   (Japan)

^b TOKYO CITY UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; CRYSTAL ATOMIC STRUCTURE; CRYSTAL ORIENTATION; INTERFACES (MATERIALS); MATHEMATICAL MODELS; MOLECULAR STRUCTURE; OXIDATION; SEMICONDUCTING SILICON; SILICA; X RAY PHOTOELECTRON SPECTROSCOPY;

FIRST PRINCIPLE MOLECULAR ORBITAL (MO) CALCULATIONS;

SEMICONDUCTOR METAL BOUNDARIES;

EID: 0034301163     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00469-4     Document Type: Article

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