Asymmetrical critical current density and its influence on electromigration of two-level W-plug interconnection

Journal of the Electrochemical Society

Volumn 147, Issue 10, 2000, Pages 3840-3844

  Huang, J S ^a   Oates, A S ^a   Obeng, Y S ^a   Brown, Walter L ^a  

^a LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; ELECTRIC CONDUCTORS; ELECTRIC CONNECTORS; ELECTRIC CONTACTS; ELECTROMIGRATION; PASSIVATION; SCANNING ELECTRON MICROSCOPY;

ELECTROMIGRATION FAILURE; MULTILEVEL STRUCTURES; PASSIVATION LAYER; W-PLUG INTERCONNECTION;

CRITICAL CURRENT DENSITY (SUPERCONDUCTIVITY);

EID: 0034294433     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1393982     Document Type: Article

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