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Volumn 29, Issue 9, 1996, Pages 3283-3291

On the importance of chain reptation in models of dissolution of glassy polymers

Author keywords

[No Author keywords available]

Indexed keywords

BOUNDARY LAYERS; CHEMICAL VARIABLES CONTROL; DISSOLUTION; INTERFACES (MATERIALS); MATHEMATICAL MODELS; MOLECULAR WEIGHT; NUMERICAL ANALYSIS; RUBBER; SOLVENTS; TRANSPORT PROPERTIES;

EID: 0030127405     PISSN: 00249297     EISSN: None     Source Type: Journal    
DOI: 10.1021/ma951450s     Document Type: Article
Times cited : (102)

References (37)
  • 1
    • 0024890062 scopus 로고
    • Resists in Microlithography
    • Hess, D. W., Jensen, K. F., Eds.; Am. Chem. Soc. Adv. Chem. Series 221; American Chemical Society: Washington, DC
    • O'Brien, M. J.; Soane, D. S. Resists in Microlithography. In Microelectronics Processing: Chemical Engineering Aspects; Hess, D. W., Jensen, K. F., Eds.; Am. Chem. Soc. Adv. Chem. Series 221; American Chemical Society: Washington, DC, 1989; pp 325-376.
    • (1989) Microelectronics Processing: Chemical Engineering Aspects , pp. 325-376
    • O'Brien, M.J.1    Soane, D.S.2
  • 4
    • 85033811326 scopus 로고    scopus 로고
    • PCT Int. Appl. WO 91 03 515 (U.S.Appl. 406.087, Sept. 11, 1989)
    • Nauman, E. B.; Lynch, J. C. PCT Int. Appl. WO 91 03 515 (U.S.Appl. 406.087, Sept. 11, 1989).
    • Nauman, E.B.1    Lynch, J.C.2
  • 7
    • 0002614757 scopus 로고
    • The Solution Process
    • Crank, J., Park, G. S., Eds.; Academic Press: New York
    • Ueberreiter, K. The Solution Process. In Diffusion in Polymers; Crank, J., Park, G. S., Eds.; Academic Press: New York, 1968.
    • (1968) Diffusion in Polymers
    • Ueberreiter, K.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.