The effect of end-group on novolak resin properties

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3333, Issue , 1998, Pages 1241-1250

  Zampini, Anthony ^a   Monaghan, Michael J ^a   Xu, Cheng Bai ^a   Cardin, William J ^a  

^a SHIPLEY COMPANY   (United States)

Author keywords

Dissolution enhancement; End group effect; m cresol; Novolak; Photoresist; Photospeed; Site reactivity

Indexed keywords

CONDENSATION REACTIONS; GROUP TECHNOLOGY; METHANOL; MICROCRYSTALS; NUCLEAR MAGNETIC RESONANCE; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; PHOTORESISTORS; PHOTORESISTS; RESINS; SURFACE TREATMENT; THICKNESS MEASUREMENT;

END-GROUP EFFECT; M-CRESOL; NOVOLAK; PHOTOSPEED; SITE REACTIVITY;

DISSOLUTION;

EID: 0343193724     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.312377     Document Type: Conference Paper

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