Positive and negative ions in RF plasmas of SF6/N2 and SF6/Ar mixtures in a planar diode

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 2, 1997, Pages 847-853

  Sasaki, Shinya ^a   Ishikawa, Itsuo ^a   Nagaseki, Kazuya ^b   Saito, Yukinori ^a   Suganomata, Shinji ^a  

^a UNIVERSITY OF YAMANASHI   (Japan)

^b TOKYO ELECTRON LTD   (Japan)

Author keywords

Mass spectrometry; Negative ion species; Positive ion species; RF discharge; SF6 gas; SF6 Ar mixture; SF6 N2 mixture

Indexed keywords

POSITIVE/NEGATIVE ION SPECIES; RADIOFREQUENCY DISCHARGES;

ARGON; COMPOSITION EFFECTS; FLUORINE COMPOUNDS; IONS; MASS SPECTROMETRY; NITROGEN;

PLASMAS;

EID: 0031071139     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.847     Document Type: Article

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