Sensitivity studies of silicon etching in chlorine/argon plasmas

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 5, 2000, Pages 2130-2136

  Kleditzsch, S ^a   Riedel, U ^a  

^a UNIVERSITY OF HEIDELBERG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CHLORINE; COMPUTER SIMULATION; DIFFERENTIAL EQUATIONS; ELECTRON ENERGY LEVELS; MATHEMATICAL MODELS; SEMICONDUCTING SILICON; SENSITIVITY ANALYSIS; SURFACE CHEMISTRY;

ELECTRON ENERGY DISTRIBUTION FUNCTION (EEDF); STIRRED REACTORS;

PLASMA ETCHING;

EID: 0034275381     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1285997     Document Type: Article

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