Powder formation in germane-silane plasmas

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 5, 2000, Pages 2116-2121

  Van Swaaij, R A C M M ^a   Girwar, B S ^a   Metselaar, J W ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POWDERS; SEMICONDUCTING GERMANIUM COMPOUNDS; SILANES;

GERMANE-SILANE PLASMAS; POWDER FORMATION;

SEMICONDUCTOR PLASMAS;

EID: 0034275172     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1286022     Document Type: Article

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