Similarities in spatial distributions of absolute GeH2 density, radical production rate and particle amount in GeH4 RF discharges

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 37, Issue 4 B, 1998, Pages

  Kawasaki, Hiroharu ^a   Kida, Junichirou ^a   Sakamoto, Kazutaka ^a   Fukuzawa, Tsuyoshi ^a   Shiratani, Masaharu ^a   Watanabe, Yukio ^a  

^a KYUSHU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRIC DISCHARGES; GERMANIUM COMPOUNDS; PLASMA DENSITY; PLASMA SHEATHS; PLASMA SOURCES; SILANES;

PARTICLE GROWTH PROCESS; PLASMA CHEMICAL VAPOR DEPOSITION;

PARTICLE BEAM DYNAMICS;

EID: 0032046808     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.l475     Document Type: Article

References (15)