Optical properties and defect structure of CVD diamond films annealed at 900-1600°C

Physica Status Solidi (A) Applied Research

Volumn 181, Issue 1, 2000, Pages 37-44

  Khomich, A ^a   Ralchenko, V ^b   Nistor, L ^c   Vlasov, I ^b   Khmelnitskiy, R ^d  

^a INSTITUTE OF RADIO ENGINEERING AND ELECTRONICS   (Russian Federation)

^b PROKHOROV GENERAL PHYSICS INSTITUTE   (Russian Federation)

^c NATIONAL INSTITUTE OF MATERIALS PHYSICS   (Romania)

^d LEBEDEV PHYSICAL INSTITUTE   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTAL DEFECTS; GRAIN BOUNDARIES; HYDROGEN BONDS; INFRARED SPECTROSCOPY; LIGHT ABSORPTION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THICK FILMS; TRANSMISSION ELECTRON MICROSCOPY; ULTRAVIOLET RADIATION; ULTRAVIOLET SPECTROSCOPY; VACUUM APPLICATIONS;

DARKENING; MICROWAVE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

DIAMOND FILMS;

EID: 0034275163     PISSN: 00318965     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-396X(200009)181:1<37::AID-PSSA37>3.0.CO;2-T     Document Type: Article

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