Optical characterization of thick diamond films produced by microwave plasma chemical vapor deposition

Journal of Wide Bandgap Materials

Volumn 5, Issue 4, 1997, Pages 361-369

  Khomich, A V ^a   Ralchenko, V G ^b,c   Smolin, A A ^b,c   Migulin, V V ^b   Pimenov, S M ^b,c   Vlasov, I I ^b   Konov, V I ^b,c  

^a INST OF RADIO ENG AND ELECTRONICS   (Russian Federation)

^b PROKHOROV GENERAL PHYSICS INSTITUTE   (Russian Federation)

^c Diagascrown Stock Co   (Russian Federation)

Author keywords

Diamond films; Optical properties; Polishing; Silicon carbide

Indexed keywords

CRYSTAL DEFECTS; INFRARED SPECTROSCOPY; MICROWAVES; OPTICAL PROPERTIES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLISHING; RAMAN SPECTROSCOPY; SILICON CARBIDE;

DIAMOND WAFERS; MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION; SILICON SUBSTRATES; ULTRAVIOLET VISIBLE SPECTROSCOPY;

DIAMOND FILMS;

EID: 23844477977     PISSN: 1524511X     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (13)

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