Fabrication and characterization of a micromachined 5 mm inductively coupled plasma generator

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 5, 2000, Pages 2446-2451

  Hopwood, J ^a   Minayeva, O ^a   Yin, Y ^a  

^a Northeastern University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITORS; ELECTRIC INDUCTORS; ELECTRONS; IONS; MICROMACHINING; SILICON WAFERS; VACUUM TECHNOLOGY;

INDUCTIVELY COUPLED PLASMA GENERATORS;

PLASMA SOURCES;

EID: 0034266741     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1288945     Document Type: Article

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