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Volumn 21, Issue 9, 2000, Pages 406-408

Inversion MOS capacitance extraction for high-leakage dielectrics using a transmission line equivalent circuit

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE MEASUREMENT; DIELECTRIC DEVICES; ELECTRIC POWER FACTOR CORRECTION; ELECTRON TUNNELING; EQUIVALENT CIRCUITS; LEAKAGE CURRENTS; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR DEVICE MODELS;

EID: 0034258708     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (34)

References (8)
  • 1
    • 0032679052 scopus 로고    scopus 로고
    • MOS capacitance measurements for high-leakage thin dielectrics
    • K. Yang and C. Hu, "MOS capacitance measurements for high-leakage thin dielectrics," IEEE Trans. Electron. Devices, vol. 46, p. 100, 1999.
    • (1999) IEEE Trans. Electron. Devices , vol.46 , pp. 100
    • Yang, K.1    Hu, C.2
  • 2
    • 0032680955 scopus 로고    scopus 로고
    • Estimating oxide thickness of tunnel oxides down to 1.4 nm using conventional capacitance-voltage measurements on MOS capacitors
    • W. Henson et al., "Estimating oxide thickness of tunnel oxides down to 1.4 nm using conventional capacitance-voltage measurements on MOS capacitors," IEEE Electron Device Lett., vol. 20, pp. 179-181, 1999.
    • (1999) IEEE Electron Device Lett. , vol.20 , pp. 179-181
    • Henson, W.1
  • 3
    • 0032689170 scopus 로고    scopus 로고
    • MOS C-V characterization of ultrathin gate oxide thickness (1.3-1.8 nm)
    • Jan.
    • C.-H. Choi et al., "MOS C-V characterization of ultrathin gate oxide thickness (1.3-1.8 nm)," IEEE Electron Device Lett., vol. 20, pp. 292-294, Jan. 1999.
    • (1999) IEEE Electron Device Lett. , vol.20 , pp. 292-294
    • Choi, C.-H.1
  • 4
    • 0033169532 scopus 로고    scopus 로고
    • Impact of tunnel current and channel resistance on the characterization of channel inversion layer charge and polysilicon-gate depletion of sub-20 Å gate oxide MOSFET's
    • K. Ahmed et al., "Impact of tunnel current and channel resistance on the characterization of channel inversion layer charge and polysilicon-gate depletion of sub-20 Å gate oxide MOSFET's," IEEE Trans. Electron. Devices, vol. 46, pp. 1650-1655, 1999.
    • (1999) IEEE Trans. Electron. Devices , vol.46 , pp. 1650-1655
    • Ahmed, K.1
  • 5
    • 0015650818 scopus 로고
    • Investigation of the MOST channel conductance in weak inversion
    • J. Koomen, "Investigation of the MOST channel conductance in weak inversion," Solid-State Electron., vol. 16, pp. 801-809, 1973.
    • (1973) Solid-State Electron. , vol.16 , pp. 801-809
    • Koomen, J.1
  • 6
    • 0025439799 scopus 로고
    • Extraction of MOSFET carrier mobility characteristics and calibration of a mobility model for numerical device simulation
    • S.-W. Lee, "Extraction of MOSFET carrier mobility characteristics and calibration of a mobility model for numerical device simulation," Solid-State Electron., vol. 33, pp. 719-726, 1990.
    • (1990) Solid-State Electron. , vol.33 , pp. 719-726
    • Lee, S.-W.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.