Measuring the implantation depth of silver clusters in graphite

European Physical Journal D

Volumn 8, Issue 3, 2001, Pages 115-118

  Kenny, D J ^a   Weller, S C ^a   Couillard, M ^a   Palmer, R E ^a   Sanz Navarro, C F ^b   Smith, R ^b  

^a UNIVERSITY OF BIRMINGHAM   (United Kingdom)

^b LOUGHBOROUGH UNIVERSITY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; GRAPHITE; MOLECULAR ORIENTATION; SCANNING TUNNELING MICROSCOPY; SILVER; SILVER METALLOGRAPHY; THERMOOXIDATION;

DEPOSITION ENERGY; DEPTH DISTRIBUTION; GRAPHITE SURFACES; IMPLANTATION DEPTH; INDUCED DEFECTS; MOLECULAR DYNAMICS SIMULATIONS; SILVER CLUSTER; THERMAL OXIDATION;

MOLECULAR DYNAMICS;

EID: 0034258171     PISSN: 14346060     EISSN: None     Source Type: Journal    
DOI: 10.1007/s100530170073     Document Type: Article

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