Atomic-scale surface morphology of ultrathin thermal oxide formed on Si(100) surface

Applied Surface Science

Volumn 162, Issue , 2000, Pages 62-68

  Fujimura, Masaaki ^a   Inoue, Kouta ^a   Nohira, Hiroshi ^a   Hattori, Takeo ^a  

^a TOKYO CITY UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL ATOMIC STRUCTURE; INTERFACES (MATERIALS); MORPHOLOGY; OXIDATION; SILICON; SURFACE ROUGHNESS; THERMAL EFFECTS; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

THERMAL OXIDE;

SILICA;

EID: 0034249960     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00171-9     Document Type: Article

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