Effects of surface patterning in thin film structures on the thermal radiative properties during rapid thermal processing

American Society of Mechanical Engineers, Heat Transfer Division, (Publication) HTD

Volumn 361-2, Issue , 1998, Pages 93-98

  Tada, Haruna ^a   Abramson, Alexis R ^a   Miaoulis, Ioannis N ^a   Wong, Peter Y ^a   Nieva, Patricia ^a   Zavracky, Paul ^a  

^a TUFTS UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL DEFECTS; HEAT RADIATION; MATHEMATICAL MODELS; MICROELECTRONIC PROCESSING; SEMICONDUCTOR DEVICE STRUCTURES; SEMICONDUCTOR DOPING; SILICON WAFERS; TEMPERATURE CONTROL; TEMPERATURE DISTRIBUTION; THERMAL STRESS; THERMOANALYSIS; THIN FILMS;

RAPID THERMAL PROCESSING (RTP);

SEMICONDUCTING FILMS;

EID: 0032304328     PISSN: 02725673     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)