Kinetic study of the metalorganic chemical vapor deposition of PbTiO3 films from Pb(C2H5)4/Ti(i-OC3H7)4/O2 reaction system

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 8, 2000, Pages 4964-4969

  Hong, Lu Sheng ^a   Wei, Chung Chieh ^a  

^a NATIONAL TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; DISSOCIATION; FILM GROWTH; LEAD COMPOUNDS; MATHEMATICAL MODELS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; REACTION KINETICS; SUBSTRATES; THIN FILMS;

ELEY-RIDEAL MECHANISMS;

DIELECTRIC FILMS;

EID: 0034245112     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.4964     Document Type: Article

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