Substrate-structure dependence of Ag electromigration on Au-precovered Si(111) surfaces

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 7 B, 2000, Pages 4438-4442

  Shi, Fangxiao ^a,b   Shiraki, Ichiro ^a   Nagao, Tadaaki ^a,b   Hasegawa, Shuji ^a,b  

^a UNIVERSITY OF TOKYO   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

Alloy; Eleclromigration; Scanning electron microscopy; Silicon surface; Surface migration; Surface superstructure

Indexed keywords

ELECTROMIGRATION; MONOLAYERS; PHASE TRANSITIONS; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SCANNING ELECTRON MICROSCOPY; SILVER; SUBSTRATES; SURFACE STRUCTURE; THERMAL EFFECTS;

SILVER ELECTROMIGRATION; SUBSTRATE STRUCTURE;

SEMICONDUCTING SILICON;

EID: 0034229709     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.4438     Document Type: Article

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