PEEM and REM studies of surface dynamics: Electromigration and Cl adsorption and desorption

Surface Science

Volumn 357-358, Issue , 1996, Pages 820-824

  Shidahara, Y ^a   Aoki, K ^a   Tanishiro, Y ^a   Minoda, H ^a   Yagi, K ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Adsorption; Chlorine; Photoemission electron microscopy (PEEM); Reflection electron microscopy (REM); Silicon

Indexed keywords

ADSORPTION; ANISOTROPY; BAND STRUCTURE; CHLORINE; DESORPTION; ELECTROMIGRATION; ELECTRON BEAMS; ELECTRON MICROSCOPY; IRRADIATION; PHOTOEMISSION; REFLECTION; SEMICONDUCTING SILICON;

PHOTOEMISSION ELECTRON MICROSCOPY; REFLECTION ELECTRON MICROSCOPY; STEP BANDS;

SURFACE PHENOMENA;

EID: 0030168112     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/0039-6028(96)00172-0     Document Type: Article

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