Migration of a Si microcluster due to the electron wind on a Si(001) surface

Applied Physics Letters

Volumn 68, Issue 11, 1996, Pages 1493-1494

  Doi, Takahisa ^a   Ichikawa, Masakazu ^b   Hosoki, Shigeyuki ^a   Ninomiya, Ken ^a  

^a HITACHI LTD   (Japan)

^b JT RES CENTER FOR ATOM TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0342951008     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.116265     Document Type: Article

References (20)

1. J. M. Zhou, S. Baba, and A. Kinbara, Thin Solid Films 98, 109 (1982).
2. H. Yasunaga, Y. Kubo, and N. Okuyama, Jpn. J. Appl. Phys. 25, L400 (1986).
3. A. Yamanaka and K. Yagi, Surf. Sci. 242, 181 (1991).
4. K. Anno, N. Nakamura, and S. Kono, Surf. Sci. 260, 53 (1992).
5. H. Yasunaga and A. Natori, Surf. Sci. Rep. 15, 205 (1992).
6. A. V. Latyshev, A. B. Krasil'nikov, A. L. Aseev, and S. I. Stenin, JETP Lett. 48, 526 (1988).
7. H. Kahata and K. Yagi, Jpn. J. Appl. Phys. 28, L858 (1989).
8. M. Ichikawa and T. Doi, Appl. Phys. Lett. 60, 1082 (1992).
9. T. Doi and M. Ichikawa, Jpn. J. Appl. Phys. 34, 25 (1995).
10. H. Tokumoto and M. Iwatsuki, Jpn. J. Appl. Phys. 32, 1368 (1993).
11. T. Abukawa, S. Kono, and T. Sakamoto, Jpn. J. Appl. Phys. 28, L303 (1989).
12. Y. Enta, S. Suzuki, S. Kono, and T. Sakamoto, Phys. Rev. B 39, 5524 (1989).
13. S. Stoyanov, Jpn. J. Appl. Phys. 30, 1 (1991).
14. S. Stoyanov, J. Cryst. Growth 94, 751 (1989).
15. H. Kahata and K. Yagi, Jpn. J. Appl. Phys. 28, L1042 (1989).
16. H. Kahata and K. Yagi, Surf. Sci. 220, 131 (1989).
17. T. Doi and M. Ichikawa, Jpn. J. Appl. Phys. 34, 3637 (1995).
18. Y.-W. Mo, B. S. Swartzentruber, R. Kariotis, M. B. Webb, and M. G. Lagally, Phys. Rev. Lett. 63, 2393 (1989).
19. T. Ichinokawa, C. Haginoya, D. Inoue, H. Itoh, and J. Kirschner, Jpn. J. Appl. Phys. 32, 1379 (1993).
20. M. Ichikawa, Mat. Sci. Rep. 4, 147 (1989).