Sputter deposition and annealing of Ta, TaSix and TaBx composite films and their application in next generation lithography masks

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 4 I, 2000, Pages 1119-1124

  Racette, Kenneth ^a   Brooks, Cameron ^a   Guarnieri, C Richard ^a,b   Hendy, Dennis ^a  

^a IBM MICROELECTRONICS   (United States)

^b North Carolina State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; LIGHT ABSORPTION; LITHOGRAPHY; MASKS; SPUTTER DEPOSITION; TANTALUM; TANTALUM COMPOUNDS;

REFRACTORY MASK FILMS;

SURFACE CHEMISTRY;

EID: 0034229028     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582310     Document Type: Article

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