Status of x-ray mask development at the IBM Advanced Mask Facility

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3412, Issue , 1998, Pages 99-105

  Racette, Kenneth C ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

Defect density; Image placement; Image resolution; Image size; Mask fabrication; Refractory x ray absorber; Tantalum silicon; X ray lithography; X ray mask

Indexed keywords

ANNEALING; ETCHING; REFRACTORY MATERIALS; ULTRAVIOLET RADIATION; X RAYS;

IMAGE PLACEMENT; IMAGE RESOLUTION; X RAY ABSORBERS; X RAY MASKS;

MASKS;

EID: 0038335884     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.328846     Document Type: Conference Paper

References (6)

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